FYSS5455 Elektroni-, fotoni- ja ionisuihkumenetelmät materiaalitieteissä (5 op)

• interaction of energetic ions, electrons and photons with matter
• thin film deposition techniques
• ion, electron and photon beam based characterization techniques for thin films and surfaces
• project work including characterization of thin films using at least two different techniques, reporting performed analysis and presenting the results in a seminar

After passing the course successfully the student

• knows the most used thin film deposition techniques and applications of thin films

• knows the basic interactions between photons, electrons and ions with matter and understands the underlying physics of different characterization techniques

• knows the different physical and chemical properties which can be probed using electron, photon and ion beam techniques

• is able to choose a suitable characterization technique for a given materials research problem

• has hands-on experience of thin film characterization

• can critically compare results obtained using different techniques

• can evaluate ion beam analysis (e.g. Rutherford backscattering spectrometry) data

• can write a brief material analysis report

Preferably basic knowledge of nuclear and materials physics. 

Lecture slides, other material given during the course.