FYSS6330 Mikroskopia ja litografia (7 op)

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Opinnon taso:
Syventävät opinnot
Arviointiasteikko:
0-5
Suorituskieli:
englanti
Vastuuorganisaatio:
Fysiikan laitos
Opetussuunnitelmakaudet:
2020-2021, 2021-2022, 2022-2023, 2023-2024

Kuvaus

  • Basic imaging science

  • optical-, electron-, ion-, and scanning probe microscopy

  • near-field optical microscopy

  • basics of micro- and nanolithography

  • Photolithography

  • electron and ion beam lithography

  • scanning probe lithography 

Osaamistavoitteet

At the end of this course, students will be able to

  • select appropriate imaging method for different samples and conditions

  • understand the limitations in different microscopy methods

  • evaluate what lithography method is suitable for different patterning conditions 

Esitietojen kuvaus

FYSP1050 Introduction to Electromagnetism or equivalent. 

Oppimateriaalit

Lecture notes, website, articles, etc.

Kirjallisuus

  • Eugene Hecht, “Optics” 5th Ed, Maddison-Wesley, 2002
  • Chris Mack, “Fundamental Principles of Optical Lithography”, Wiley

Suoritustavat

Tapa 1

Kuvaus:
Given every two years starting spring 2021.
Arviointiperusteet:
Active participation is expected and group assignments are compulsory. Half of total points required for passing. The grade is based on examination (70 %), group assignments (15 %) and written assignments (15 %).
Opetusajankohta:
Periodi 4
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Suoritustapojen osat
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Osallistuminen opetukseen (7 op)

Tyyppi:
Osallistuminen opetukseen
Arviointiasteikko:
0-5
Arviointiperusteet:
Active participation is expected and group assignments are compulsory. Half of total points required for passing. The grade is based on examination (70 %), group assignments (15 %) and written assignments (15 %).
Suorituskieli:
englanti
Työskentelytavat:

Lectures, group assignments, written assignments, examination. 

Opetus