FYSS6330 Mikroskopia ja litografia (7 op)
Opinnon taso:
Syventävät opinnot
Arviointiasteikko:
0-5
Suorituskieli:
englanti
Vastuuorganisaatio:
Fysiikan laitos
Opetussuunnitelmakaudet:
2020-2021, 2021-2022, 2022-2023
Kuvaus
Basic imaging science
optical-, electron-, ion-, and scanning probe microscopy
near-field optical microscopy
basics of micro- and nanolithography
Photolithography
electron and ion beam lithography
scanning probe lithography
Osaamistavoitteet
At the end of this course, students will be able to
select appropriate imaging method for different samples and conditions
understand the limitations in different microscopy methods
evaluate what lithography method is suitable for different patterning conditions
Esitietojen kuvaus
FYSP1050 Introduction to Electromagnetism or equivalent.
Oppimateriaalit
Lecture notes, website, articles, etc.
Kirjallisuus
- Eugene Hecht, “Optics” 5th Ed, Maddison-Wesley, 2002
- Chris Mack, “Fundamental Principles of Optical Lithography”, Wiley
Suoritustavat
Tapa 1
Kuvaus:
Given every two years starting spring 2021.
Arviointiperusteet:
Active participation is expected and group assignments are compulsory. Half of total points required for passing. The grade is based on examination (70 %), group assignments (15 %) and written assignments (15 %).
Opetusajankohta:
Periodi 4
Valitaan kaikki merkityt osat
Suoritustapojen osat
x
Osallistuminen opetukseen (7 op)
Tyyppi:
Osallistuminen opetukseen
Arviointiasteikko:
0-5
Arviointiperusteet:
Active participation is expected and group assignments are compulsory. Half of total points required for passing. The grade is based on examination (70 %), group assignments (15 %) and written assignments (15 %).
Suorituskieli:
englanti
Työskentelytavat:
Lectures, group assignments, written assignments, examination.