FYSS6330 Mikroskopia ja litografia (7 op)

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Opinnon taso:
Syventävät opinnot
Arviointiasteikko:
0-5
Suorituskieli:
englanti
Vastuuorganisaatio:
Fysiikan laitos
Opetussuunnitelmakaudet:
2017-2018, 2018-2019, 2019-2020

Kuvaus

Sisältö

Basic imaging science; optical-, electron-, ion-, and scanning probe microscopy; near-field optical microscopy; basics of micro- and nanolithography; photolithography; electron and ion beam lithography; scanning probe lithography

Suoritustavat

Examination, assignments, written assignments

Arviointiperusteet

Active participation to the course events is expected. The final grade is based on examination (70 %), assignments (15 %) and written assignments (15 %). To pass the course students need to have a final score of 50 %.

Osaamistavoitteet

At the end of this course, students will be able to select appropriate imaging method for different samples and conditions. They will also be able to evaluate what lithography method is suitable for different patterning conditions.

Lisätietoja

Given on spring semester 2nd period, every two years starting spring 2019.

Esitietojen kuvaus

Before enrolling for this course, students are expected to have studied the Introduction to Electromagnetism (FYSP1050)

Oppimateriaalit

Lecture notes, website(s), articles, etc.

Kirjallisuus

  • Eugene Hecht, “Optics” 5th Ed, Maddison-Wesley, 2002
  • Chris Mack, “Fundamental Principles of Optical Lithography”, Wiley

Suoritustavat

Tapa 1

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Osallistuminen opetukseen (7 op)

Tyyppi:
Osallistuminen opetukseen
Arviointiasteikko:
0-5
Suorituskieli:
englanti

Opetus