FYSS6330 Microscopy and Lithography (7 cr)

Study level:
Advanced studies
Grading scale:
0-5
Language:
English
Responsible organisation:
Department of Physics
Curriculum periods:
2017-2018, 2018-2019, 2019-2020

Description

Content

Basic imaging science; optical-, electron-, ion-, and scanning probe microscopy; near-field optical microscopy; basics of micro- and nanolithography; photolithography; electron and ion beam lithography; scanning probe lithography

Completion methods

Examination, assignments, written assignments

Assessment details

Active participation to the course events is expected. The final grade is based on examination (70 %), assignments (15 %) and written assignments (15 %). To pass the course students need to have a final score of 50 %.

Learning outcomes

At the end of this course, students will be able to select appropriate imaging method for different samples and conditions. They will also be able to evaluate what lithography method is suitable for different patterning conditions.

Additional information

Given on spring semester 2nd period, every two years starting spring 2019.

Description of prerequisites

Before enrolling for this course, students are expected to have studied the Introduction to Electromagnetism (FYSP1050)

Study materials

Lecture notes, website(s), articles, etc.

Literature

  • Eugene Hecht, “Optics” 5th Ed, Maddison-Wesley, 2002
  • Chris Mack, “Fundamental Principles of Optical Lithography”, Wiley

Completion methods

Method 1

Select all marked parts
Parts of the completion methods
x
Unpublished assessment item